Abstract
Telomer compositions are provided that can include at least one taxogen unit and a telogon unit, the taxogen unit being one or more of TFP, PFP, VDF, TFMA, PMVE, VF1 TFE, CTFE, BrTFE, HFP, dichlorodif luoroethylene, chlorodifluoroethylene, bromodifluoroethylene, ethylenealkyl ether, ethylene, and propylene; the telogen unit being one or more of RFQ or RClQ, wherein the RF group can be an alkyl group having at least four fluorine atoms, the RCl group can be -CCl3, and the Q group can be H, Br, or I. Chemical production processes are also provided that can include exposing a taxogen to a telogen to form a telomer.