- Titre
- Use of Laser Interferometry and Optical Emission Spectroscopy for Monitoring the Reactive Ion Etching of 6H - and 4H-SiC
- Créateurs - sans rôle
- Nicolas Camara - Foundation for Research and Technology Hellas : MRG, IESLGeorge Konstantinidis - Microelectronic Research Group (MRG)-IESL : Foundation for Research and Technology Hellas (FORTH)Konstantinos Zekentes - Foundation for Research and Technology-Hellas(FORTH) : Institute of Electronic Structure and Laser (IESL)
- Détails de publication
- Materials science forum, Vol.433-436, pp.693-696
- Éditeur
- Trans Tech Publications Ltd
- Nombre de pages
- 4
- Identifiants
- 99162022709311
- Unité académique
- Institut d'Electronique et des Systèmes - IES
- Langue
- English
- Type de ressource
- Journal article
Article de revue
Use of Laser Interferometry and Optical Emission Spectroscopy for Monitoring the Reactive Ion Etching of 6H - and 4H-SiC
Materials science forum, Vol.433-436, pp.693-696
15/09/2003
Indicateurs
1 Consultations de la notice