Abstract
We report the growth of indium nitride on AlPO4, which is a piezoelectric substrate, by using metal organic vapor phase epitaxy (MOVPE). The substrate we used was the as-grown (011) surface of an AlPO4 crystal grown by hydrothermal synthesis. InN growth occurs as the nonpolar M-plane. The structural, optical, and electrical properties of the epilayer are comparable with those of layers obtained by conventional growth on polar GaN MOVPE templates deposited on C-plane sapphire. We discuss the utilization of other MX-O-4 oxides for growing nitrides.