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SPS-prepared targets for sputtering deposition of phase change films.
Article de revue   Open Access   Avec comité de lecture

SPS-prepared targets for sputtering deposition of phase change films.

Marc Marie-Maurice Meledge Essi, Pascal Yot, Geoffroy Chevallier, Claude Estournès et Annie Pradel
Digest Journal of Nanomaterials and Biostructures , Vol.6(4), pp.1777-1782
10/2011

Résumé

Nano materials Thin films RF sputtering Spark plasma sintering Chalcogenides Phase-change materials
Phase-change materials like thin films from the systems [Ge1-xPbx]Te and Ge[Te1-xSex] are of interest for data storage. For these compositions amorphous materials can not be obtained by melt quenching. However, Suitable films can be obtained using RF sputtering. Spark plasma sintering (SPS) was used to densify the powders to obtain large targets. Synthesis conditions and characterisations of the targets are reported. Amorphous nano films were obtained using the sintered targets and characterised.

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