Résumé
Time-resolved photoluminescence and light-induced transient grating techniques were applied for temperature and excitation dependent internal quantum efficiency and carrier diffusion investigation in silicon-doped epilayer and AlxGa1-xN MQWs (x > 0.6). Decrease of photoluminescence efficiency at high excitations correlated with increase of diffusion coefficient as well as nonradiative recombination rate, indicating excitation and temperature dependent localized exciton density reduction. Excitation-dependent lifetime decrease was less pronounced than the corresponding drop of the time-integrated photoluminescence efficiency dominated by thermal dissociation of excitons. At lowest excitations excitons were found captured to vacancy complexes. With increase of excitation exciton ionization appeared, leading to enhanced nonradiative recombination of holes on aluminum vacancies and simultaneous droop of PL efficiency due to saturated bimolecular free carrier plasma recombination. At initial recombination stages and high excitations diffusive recombination on dislocations was also revealed. Modelling provided free exciton binding energies of 104, 140 meV in the MQWs and in the layer; exciton localization energies in 12-35 meV range; localized exciton lifetimes in 2-4 ns range; free exciton and carrier radiative recombination rate coefficients of rex = (0.6 0.2)109(T/300)-1 1/s and Brad = (7 1)10-10(T/300)-3/2 cm3/s, respectively. Vacancy complex capture cross section for excitons was determined to be = (2 1)10-16(300/T)2 cm2. Electron and hole capture cross sections to aluminum vacancy were modeled (1.5 1)10-13 cm2 and (7 1)10-13 cm2, respectively. Dislocation Coulomb radius for free carrier recombination was found to be 12-15 nm.