Organic/inorganic thin films deposited from diethoxydimethylsilane by plasma enhanced chemical vapor deposition

Journal article

Peer reviewed

Stéphanie Roualdes, Nadine Hovnanian, Arie van Der Lee, Rene Berjoan and Jean Durand

Journal of Non-Crystalline Solids, Vol.248(2-3), pp.235-246

06/1999

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Title: Organic/inorganic thin films deposited from diethoxydimethylsilane by plasma enhanced chemical vapor deposition
Creators - without role: Stéphanie Roualdes - École Normale Supérieure - PSL
Nadine Hovnanian - École Normale Supérieure - PSL
Arie van Der Lee - Université de Montpellier, Institut Européen des Membranes - IEM
Rene Berjoan - Centre National de la Recherche Scientifique
Jean Durand - École Normale Supérieure - PSL
Publication Details: Journal of Non-Crystalline Solids, Vol.248(2-3), pp.235-246
Identifiers: 9946528009311
Academic Unit: Institut Européen des Membranes - IEM
Language: English
Resource Type: Journal article
Local Fields: hal-03684310