A. Shchepetov - CNRS, Inst Elect Microelect & Nanotechnol, UMR 8520, F-59652 Villeneuve Dascq, France
C. Gardes - CNRS, Inst Elect Microelect & Nanotechnol, UMR 8520, F-59652 Villeneuve Dascq, France
Y. Roelens - CNRS, Inst Elect Microelect & Nanotechnol, UMR 8520, F-59652 Villeneuve Dascq, France
A. Cappy - CNRS, Inst Elect Microelect & Nanotechnol, UMR 8520, F-59652 Villeneuve Dascq, France
S. Bollaert - CNRS, Inst Elect Microelect & Nanotechnol, UMR 8520, F-59652 Villeneuve Dascq, France
S. Boubanga-Tombet - Univ Montpellier 2, GES, CNRS, UMR 5650, F-34950 Montpellier, France
F. Teppe - Univ Montpellier 2, GES, CNRS, UMR 5650, F-34950 Montpellier, France
D. Coquillat - Univ Montpellier 2, GES, CNRS, UMR 5650, F-34950 Montpellier, France
S. Nadar - Univ Montpellier 2, GES, CNRS, UMR 5650, F-34950 Montpellier, France
N. Dyakonova - Univ Montpellier 2, GES, CNRS, UMR 5650, F-34950 Montpellier, France
H. Videlier - Univ Montpellier 2, GES, CNRS, UMR 5650, F-34950 Montpellier, France
W. Knap - Tohoku Univ, Sendai, Miyagi 9808577, Japan
D. Seliuta - Inst Semicond Phys, LT-01108 Vilnius, Lithuania
R. Vadoklis - Inst Semicond Phys, LT-01108 Vilnius, Lithuania
G. Valusis - Inst Semicond Phys, LT-01108 Vilnius, Lithuania