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Morphological properties of chemical vapour deposited AlN films
Journal article   Peer reviewed

Morphological properties of chemical vapour deposited AlN films

R. Rodríguez-Clemente, B. Aspar, N. Azema, B. Armas, C. Combescure, J. Durand and A. Figueras
Journal of Crystal Growth, Vol.133(1-2), pp.59-70
10/1993

Abstract

In this paper we analyse some results on AIN CVD film deposition, published in the literature, from a morphological point of view, and we propose a model to explain the observed preferential orientations based on the reactivity of the AIN crystal faces of the equilibrium form.
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