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MOCVD growth of Bi2Te3 layers using diethyltellurium as a precursor
Journal article   Peer reviewed

MOCVD growth of Bi2Te3 layers using diethyltellurium as a precursor

Alain Giani, A. Boulouz, F. Pascal-Delannoy, A. Foucaran and A. Boyer
Thin Solid Films, Vol.315(1-2), pp.99 - 103
03/1998
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