Lewis acid deprotection of silyl-protected oligonucleotides and base-sensitive oligonucleotide analogues

Fernando Ferreira; Jean-Jacques Vasseur; François Morvan

doi:10.1016/j.tetlet.2004.06.081

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Lewis acid deprotection of silyl-protected oligonucleotides and base-sensitive oligonucleotide analogues

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Lewis acid deprotection of silyl-protected oligonucleotides and base-sensitive oligonucleotide analogues

Fernando Ferreira, Jean-Jacques Vasseur et François Morvan

Tetrahedron letters, Vol.45(33), pp.6287-6290

09/08/2004

DOI: https://doi.org/10.1016/j.tetlet.2004.06.081

Résumé

DNA

Sate

Silyl protecting group

Teoc

Tse

[Display omitted] Oligonucleotides protected with N-(trimethylsilylethoxycarbonyl) (Teoc) and P-(trimethylsilylethanol) (Tse) groups were synthesized and deprotected by a single ZnBr 2 treatment. Teoc group stabilized dA against depurination. This strategy was applied to the synthesis of base-sensitive oligonucleotide prodrugs bearing S-acetyl-2-thioethyl (Sate) phosphotriesters.

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Détails

Titre: Lewis acid deprotection of silyl-protected oligonucleotides and base-sensitive oligonucleotide analogues
Créateurs - sans rôle: Fernando Ferreira
Jean-Jacques Vasseur
François Morvan
Détails de publication: Tetrahedron letters, Vol.45(33), pp.6287-6290
Éditeur: Elsevier Ltd
Nombre de pages: 4
Identifiants: 99139014109311
Unité académique: Institut des Biomolécules Max Mousseron - IBMM
Langue: English
Type de ressource: Journal article