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Identification of influence factors in a thermal model of a plasma-assisted chemical vapor deposition process
Journal article   Open access   Peer reviewed

Identification of influence factors in a thermal model of a plasma-assisted chemical vapor deposition process

Sébastien Rouquette, Laurent Autrique, Charles Chaussavoine and Laurent Thomas
Inverse Problems in Science and Engineering, Vol.15(5), pp.489-515
12/06/2007

Abstract

Inverse problem Numerical design of experiments Partial differential equations Sensitivity analysis Thin film elaboration Inverse problem Numerical design of experiments Partial differential equations Sensitivity analysis Thin film elaboration
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