Résumé
We present a method to obtain a dense array of well-oranized SiGe quantum dots in Si nanopillars oil a large substrate area by using a PS-b-PMMA block copolymer template. First, the 2D order of the template is evaluated using a pair correlation function and a bond-orientational correlation function. It is shown that the holes contained in the polystyrene template form a Structure presenting a hexatic order. This template is then used to fabricate the nanopillars using the following method: in a first step, the copolymer template serves as a deposition mask to fabricate a hexagonal array of Pt dots. In a second step, the Pt dot pattern is transferred to an alternation of Si and SiGe layers on a Silicon Substrate with an anisotropically etching using Cl-2/O-2 plasma.