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Experimental validation of an accelerated method of oxide-trap-level characterization for predicting long term thermal effects in metal oxide semiconductor devices
Journal article   Peer reviewed

Experimental validation of an accelerated method of oxide-trap-level characterization for predicting long term thermal effects in metal oxide semiconductor devices

Frédéric Saigné, L. Dusseau, J. Fesquet, J. Gasiot, R. Ecoffet, J.P. David, R.D. Schrimpf and K.F. Galloway
IEEE Transactions on Nuclear Science, Vol.44(6), pp.2001 - 2006
2006
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