Effects of processing parameters on the properties of tantalum nitride thin films deposited by reactive sputtering

Journal article

Peer reviewed

J. Nazon, J. Sarradin, V. Flaud, Jean-Claude Tedenac and N. Fréty

Journal of Alloys and Compounds, Vol.on line

2007

Abstract

thin films

tatalum nitride

sputtering

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Title: Effects of processing parameters on the properties of tantalum nitride thin films deposited by reactive sputtering
Creators - without role: J. Nazon - École Nationale Supérieure de Chimie de Montpellier
J. Sarradin - École Nationale Supérieure de Chimie de Montpellier
V. Flaud - Institut Charles Gerhardt Montpellier
Jean-Claude Tedenac - École Nationale Supérieure de Chimie de Montpellier
N. Fréty - Université de Montpellier, Institut Charles Gerhardt Montpellier - ICGM
Publication Details: Journal of Alloys and Compounds, Vol.on line
Identifiers: 9933845209311
Academic Unit: Institut Charles Gerhardt Montpellier - ICGM
Language: English
Resource Type: Journal article
Local Fields: hal-00188386