"Effect of plasma treatments on a porous low-k materials. Study of pore sealing"

Journal article

Peer reviewed

W. Puyrenier, V. Rouessac, L. Broussous, D. Rebiscoul and A. Ayral

Microporous and Mesoporous Materials, Vol.106, pp.40-48

2007

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Title: "Effect of plasma treatments on a porous low-k materials. Study of pore sealing"
Creators - without role: W. Puyrenier - STMicroelectronics
V. Rouessac - Université de Montpellier, Institut Européen des Membranes - IEM
L. Broussous - STMicroelectronics
D. Rebiscoul - Commissariat à l'Énergie Atomique et aux Énergies Alternatives
A. Ayral - Université de Montpellier, Institut Européen des Membranes - IEM
Publication Details: Microporous and Mesoporous Materials, Vol.106, pp.40-48
Identifiers: 9947479709311
Academic Unit: Institut Européen des Membranes - IEM
Language: English
Resource Type: Journal article
Local Fields: hal-00204167