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Deep reactive etching ion etching of thermally co-evaporated Te-Ge films for IR integrated optics components
Journal article   Peer reviewed

Deep reactive etching ion etching of thermally co-evaporated Te-Ge films for IR integrated optics components

Caroline Vigreux, Séverine de Sousa, Véronique Foucan, Eléonore Barthélémy and Annie Pradel
Microelectronic Engineering, Vol.88
2011
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