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Contribution of oxide traps on defect creation and LVSILC conduction on ultra thin gate oxide devices
Journal article   Peer reviewed

Contribution of oxide traps on defect creation and LVSILC conduction on ultra thin gate oxide devices

D. Zander, Frédéric Saigné, A. Meinertzhagen and C. Petit
Microelectronics Reliability, Vol.258, pp.135-140
2003
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