Abstract
This thesis deals with the integration of III-Sb based material on silicon substrate by Molecular Beam Epitaxy (MBE). A first bibliographic study has been led in order to understand the stakes and to evaluate the different approaches to decrease the defects density in the III-V epitaxial layers. In the second chapter, I give the details of the work done to realize a reproducible, efficient and robust silicon substrate surface preparation and I show its impact on the III-Sb heterostructures epitaxially grown on Si. In the last part of this thesis, I first present the studies led to evaluate the impact of the substrate miscut and of the GaSb buffer, these two parameters being very important in a photonic/microelectronic integration perspective. Then, I describe the complete optimization study of the growth conditions of AlSb or Al nucleation layers. I show that the best heterostructures properties are obtained for a nucleation layer of 4 monolayers (ML) of AlSb epitaxially grown at 450°C or 1 ML of Al deposited between 450 and 500°C. Finally, I propose some ways for optimization.