Abstract
Microwave near-field microscopes are emerging tools for material characterization. In this work, a near-field probe was designed, described and analyzed in terms of performance and resolution. This probe has been associated with two microscopes in the near microwave field. The first microscope is based on intensity reflectometry and evaluated the quality and lateral resolution of the probe. This resolution can reach a subwavelength dimension, opening the way to local characterization of materials. The second experiment presents the design of a materials characterization bench. This system uses an I/Q mixer to extract information in intensity and phase of near-field interaction. Finally, the last experiment concerns electromagnetic injection in the near field of an out-of-band signal on a communication module. The overall results show that the near-field injection experiment has the potential to become an important metrology tool for susceptibility studies.