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Talbot displacement lithography with soft elastomeric conformal phase masks
Acte de colloque   Open Access

Talbot displacement lithography with soft elastomeric conformal phase masks

Rudy Desgarceaux, Zhanna Santibayeva, Francesco Pedaci et Benoit Charlot
2018 Symposium on Design, Test, Integration & Packaging of MEMS and MOEMS (DTIP), pp.1-5
2018 Symposium on Design, Test, Integration & Packaging of MEMS and MOEMS (DTIP) (Roma, France, 22/05/2018–25/05/2018)

Résumé

We report a novel method to create 2D hierarchical nanopatterns with a simple PDMS scaffold made of a replica of a grating and a spacer. This technique takes advantage of the Talbot effect that is the creation of an interference pattern from a grating at a given distance normal to the grating surface. By combining a conformal soft mask made of PDMS and a spacer to separate the phase shift mask from the photoresist, we can take advantage of the interference pattern to imprint smaller structures.

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