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Strain and wafer curvature of 3C-SiC films on silicon: influence of the growth conditions
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Strain and wafer curvature of 3C-SiC films on silicon: influence of the growth conditions

M. Zielinski, S. Ndiaye, T. Chassagne, Sandrine Juillaguet, Renata Lewandowska, M. Portail, A. Leycuras et Jean Camassel
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, Vol.204, pp.981-986
5th Brazo;oam/German Workshop on Applied Surface Science (Mangaratiba (BRAZIL), France, 03/04/2006)
2007

Résumé

INTRINSIC STRESSES THIN-FILMS RELAXATION REACTOR

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