Résumé
Back-gated field effect transistors (FETs) based on catalyst-free grown 3C-SiC nanowire (NW) were fabricated. Devices with rectifying Source (S) and Drain (D) contacts have been observed. In contrast with the ohmic-like devices reported in the literature, the Schottky contact barrier (SB) at S/ D regions acts beneficially for the FET performance by suppressing the off-current. At high positive gate voltages (> 10 V), the Schottky barriers tend to be more transparent leading to I-ON/I-OFF ratio equal to similar to 10(3) in contrast to the weak gating effect of the ohmic-contacted 3C-SiC NWFETs.