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Pockets engineering impact on mismatch performance on 45nm MOSFET technologies
Acte de colloque

Pockets engineering impact on mismatch performance on 45nm MOSFET technologies

C. M. Mezzomo, C. Leyris, E. Josse et G. Ghibaudo
Int. Conference on Ultimate Integration of Silicon, pp.15-18
Int. Conference on Ultimate Integration of Silicon (Aachen, Germany, 20/03/2009–20/03/2009)
18/03/2009

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