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Optical investigation of 3C-SiC hetero-epitaxial layers grown by sublimation epitaxy under gas atmosphere
Acte de colloque

Optical investigation of 3C-SiC hetero-epitaxial layers grown by sublimation epitaxy under gas atmosphere

Pawel Kwasnicki, Valdas Jokubavicius, Jianwu Sun, Hervé Peyre, Rositsa Yakimova, Mikael Syväjärvi, Jean Camassel et Sandrine Juillaguet
Materials Science Forum, Vol.778-780, pp.243-+
SILICON CARBIDE AND RELATED MATERIALS 2013, PTS 1 AND 2 (Miyasaki, Japan, 2014)
26/02/2014

Résumé

Low temperature photoluminescence 3C-SiC sublimation epitaxy Raman
We report on three 3C-SiC samples grown on off oriented 6H-SiC substrate by sublimation epitaxy under different ambient conditions. Focussing on the low temperature photoluminescence and Raman measurements, we show that compared with a growth process under vacuum atmosphere, the gas atmosphere favors the incorporation of impurities at already existing and/or newly created defect sites.

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