Résumé
In this study, we demonstrate the capability to detect microscopic stable displacement nature created by proton irradiations with a method based on the discrimination of the three major low frequency noise sources generally observed in semiconductor devices. Low frequency noise measurements are carried out in silicon in-situ phosphorus doped polycrystalline silicon serpentine resistance used as test vehicle. We observe that for the pristine sample, the voltage noise power density can be explained only considering 1/f and thermal noise contribution on the total noise, while for irradiated sample generation recombination noise prevails. Preliminary results on low frequency noise spectroscopy, used as a diagnostic tool in order to identify stable traps created by protons irradiations are presented.