Logo image
Se connecter
Highly Photo-Excited Nitride Quantum Wells: Threshold for Exciton Bleaching
Acte de colloque

Highly Photo-Excited Nitride Quantum Wells: Threshold for Exciton Bleaching

Philippe Christol, P. Bigenwald, A. Kavokin, B. Gil et P. Lefebvre
Physica Status Solidi (b), Vol.216(1), pp.481 - 486
3rd International Conference on Nitride Semiconductors (Montpellier (FR), France, 04/07/1999–09/07/1999)
11/1999

Résumé

Fichiers et liens (1)

url
Find in HALAfficher

Indicateurs

1 Consultations de la notice

Détails

Logo image