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Growth by liquid phase epitaxy and characterization of GaInAsSb and InAsSbP alloys for mid-infrared applications (2-3 um)
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Growth by liquid phase epitaxy and characterization of GaInAsSb and InAsSbP alloys for mid-infrared applications (2-3 um)

Eric Tournie, J. L Lazzari, Habib Mani, F Pitard, Claude L Alibert et Andre F Joullie
Proceedings of SPIE, Vol.1361(1), pp.641-656
Physical Concepts of Materials for Novel Optoelectronic Device Applications I: Materials Growth and Characterization
01/03/1991

Résumé

We present the liquid phase epitaxy growth (LPE) of GaInAsSb/( 1 00) GaSb and InAsSbP/( 1 00) InAs near their miscibility gap (MG) boundaries. The conditions f or growing latticematched layers of optoelectronic quality are given. The cut-off wavelength limitations due to the MG are : 2. 4 p. m for GaInAsSb and 2. 6 p. m for lnAsSbP. As an example of application results are presented on LPE grown photodiodes based on these quaternary alloys. 1 -

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