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Experimental validation of an accelerated method of oxyde trap-level characterization for predicting long term thermal effects in MOS devices
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Experimental validation of an accelerated method of oxyde trap-level characterization for predicting long term thermal effects in MOS devices

Frédéric Saigné, L. Dusseau, J. Fesquet, J. Gasiot, R. Ecoffet, J.P. David, R.D. Schrimpf et K.F. Galloway
34th IEEE Nuclear Space and Radiation Effects Conference (Snowmass, United States, 1997)

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