Résumé
The knowledge of carrier concentration of doped or non-intentionally doped layer structures grown by Molecular Beam Epitaxy (MBE) is crucial to fabricate and manage design of new advanced photodetectors called "barrier structures". This communication reports on capacitance-voltage (C-V) study on MOS structure. Simulation to define specific MOS design, allowing doping layer concentration extraction by measurements, is performed. MOS structures based on InAs/GaSb Longwave infrared (LWIR) superlattice have been fabricated and characterized. Results obtained were analyzed and compared with simulations.