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Analysis of Data Obtained Using the Thermal Step Method on a MOS Structure - An Electrostatic Approach
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Analysis of Data Obtained Using the Thermal Step Method on a MOS Structure - An Electrostatic Approach

L. Boyer, O. Fruchier, P. Notingher Jr., S. Agnel, A. Toureille, B. Rousset et J.-L. Sanchez
2008 IEEE Industry Applications Society Annual Meeting (IAS) (Edmonton, Canada, 05/10/2008–09/10/2008)

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