13.2 nm Table-Top Inspection Microscope for Extreme Ultraviolet Lithography Mask Defect Characterization

Fernando Brizuela; Yong Wang; Courtney A. Brewer; Francesco Pedaci; Weilun Chao; Erik H. Anderson; Yanwei Liu; Kenneth A. Goldberg; Patrick Naulleau; Przemyslaw Wachulak; Mario C. Marconi; David T. Attwood; Jorge J. Rocca; Carmen S. Menoni; IEEE

Acte de colloque

13.2 nm Table-Top Inspection Microscope for Extreme Ultraviolet Lithography Mask Defect Characterization

Fernando Brizuela, Yong Wang, Courtney A. Brewer, Francesco Pedaci, Weilun Chao, Erik H. Anderson, Yanwei Liu, Kenneth A. Goldberg, Patrick Naulleau, Przemyslaw Wachulak, …

2009 CONFERENCE ON LASERS AND ELECTRO-OPTICS AND QUANTUM ELECTRONICS AND LASER SCIENCE CONFERENCE (CLEO/QELS 2009), VOLS 1-5, p.2458

01/01/2009

Résumé

Engineering

Engineering, Electrical & Electronic

Optics

Physical Sciences

Physics

Physics, Applied

Science & Technology

Technology

We report on a reflection microscope that operates at 13.2-nm wavelength with a spatial resolution of 55 +/- 3 nm. The microscope uses a table-top EUV laser to acquire images of photolithography masks in 20 seconds. (C) 2009 Optical Society of America

Indicateurs

1 Consultations de la notice

Détails

Titre: 13.2 nm Table-Top Inspection Microscope for Extreme Ultraviolet Lithography Mask Defect Characterization
Créateurs - sans rôle: Fernando Brizuela - Colorado State Univ, NSF ERC Extreme Ultraviolet Sci & Technol, Ft Collins, CO 80523 USA
Yong Wang - Colorado State Univ, NSF ERC Extreme Ultraviolet Sci & Technol, Ft Collins, CO 80523 USA
Courtney A. Brewer - Colorado State Univ, NSF ERC Extreme Ultraviolet Sci & Technol, Ft Collins, CO 80523 USA
Francesco Pedaci - Colorado State Univ, NSF ERC Extreme Ultraviolet Sci & Technol, Ft Collins, CO 80523 USA
Weilun Chao - Lawrence Berkeley Natl Lab, Ctr Xray Opt, Berkeley, CA 94720 USA
Erik H. Anderson - Lawrence Berkeley Natl Lab, Ctr Xray Opt, Berkeley, CA 94720 USA
Yanwei Liu - Lawrence Berkeley Natl Lab, Ctr Xray Opt, Berkeley, CA 94720 USA
Kenneth A. Goldberg - Lawrence Berkeley Natl Lab, Ctr Xray Opt, Berkeley, CA 94720 USA
Patrick Naulleau - Lawrence Berkeley Natl Lab, Ctr Xray Opt, Berkeley, CA 94720 USA
Przemyslaw Wachulak - Colorado State Univ, NSF ERC Extreme Ultraviolet Sci & Technol, Ft Collins, CO 80523 USA
Mario C. Marconi - Colorado State Univ, NSF ERC Extreme Ultraviolet Sci & Technol, Ft Collins, CO 80523 USA
David T. Attwood - Lawrence Berkeley Natl Lab, Ctr Xray Opt, Berkeley, CA 94720 USA
Jorge J. Rocca - Colorado State Univ, NSF ERC Extreme Ultraviolet Sci & Technol, Ft Collins, CO 80523 USA
Carmen S. Menoni - Colorado State Univ, NSF ERC Extreme Ultraviolet Sci & Technol, Ft Collins, CO 80523 USA
IEEE
Détails de publication: 2009 CONFERENCE ON LASERS AND ELECTRO-OPTICS AND QUANTUM ELECTRONICS AND LASER SCIENCE CONFERENCE (CLEO/QELS 2009), VOLS 1-5, p.2458
Éditeur: IEEE
Nombre de pages: 2
Identifiants: 99149270909311
Unité académique: Centre de Biologie Structurale - CBS
Langue: English
Type de ressource: Conference proceeding