Abstract
Contrary to c-plane heterostructures, the absence of built-in electric fields in non-polar nitride-based heterostructures allows for the growth of thick quantum wells (QWs) without any decrease in the overlap between electron and hole wave functions [1]. However, lattice mismatched substrates are generally used to grow non-polar GaN, inducing strain in the heteroepitaxial layers that relax through the generation of non-radiative recombination centers. Here, we investigate by time-resolved photoluminescence the temperature (T) dependence of charge carriers recombination mechanisms in non-polar (Al,Ga)N/GaN quantum wells (QW) grown by molecular beam epitaxy on the a-facet of bulk GaN crystals. We study the influence of both QW width and barrier Al-content on the dynamics of excitons in the 10 - 320 K range.