Abstract
In order to miniaturize complex nanoelectronic devices, new lithographic technologies are being constantly explored. Lithography is a process in which patterns transferred to a substrate. Our overall goal consists in using DNA origami (OA) masks, which replace resin for a lithographic application. DNA origami enable to create patterns with a 2 nm of theoretical spatial resolution. DNA origamis (OA) are currently explored as a strategy for bottom-up nanofabrication. DNA origami method [1] consists in folding a long DNA strand into a desired shape. One of the challenges with OA is to position it preferably on precise locations on a substrate. In the present work we studied how triangular fluorescent DNA origami with 40 nm of characteristic size and 7 nm height can be selectively anchored on TiO 2 [2], while they do not bond to SiO2. The resulting tailored OA were left to interact with TiO 2 and SiO 2 substrates with different physico-chemical conditions and washing steps.