- Title
- Porosity and structure evolution of a SiOCH low k material during post-etch cleaning process
- Creators - without role
- W. Puyrenier - Université de Montpellier, Institut Européen des Membranes - IEML. Broussous - STMicroelectronics [Crolles]D. Rebiscoul - Commissariat à l'Énergie Atomique et aux Énergies AlternativesV. Rouessac - Université de Montpellier, Institut Européen des Membranes - IEMA. Ayral - Université de Montpellier, Institut Européen des Membranes - IEM
- Conference
- 2007 MRS Spring Meeting (San Franscico, United States, 09/04/2007–13/04/2007)
- Identifiers
- 9943450109311
- Academic Unit
- Institut Européen des Membranes - IEM
- Language
- English
- Resource Type
- Conference poster
- Local Fields
- hal-00275109
Conference poster
Porosity and structure evolution of a SiOCH low k material during post-etch cleaning process
2007 MRS Spring Meeting (San Franscico, United States, 09/04/2007–13/04/2007)
2007
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